A study on properties of yttrium-stabilized zirconia thin films fabricated by different deposition techniques

This paper investigates the micro-structural, chemical and crystalline properties of yttrium-stabilized zirconia (YSZ) thin films by using pulsed laser deposition (PLD), atomic layer deposition (ALD) and sputter. Atomic ratio of Y:Zr of YSZ thin films fabricated by three different deposition methods was adjustable. ALD YSZ with smaller grains has high density compared to PLD YSZ and sputter YSZ. On the other hand, the low crystallinity of ALD YSZ can be supplemented by annealing process. From these experimental results, ALD YSZ thin film has the characteristics that satisfy requirements for using an electrolyte of thin film solid oxide fuel cells.