STRUCTURE AND CHARACTERIZATION OF ZnO THIN FILM PREPARED BY SPIN COATING

ZnO thin films were prepared on silica glass substrates by a sol–gel spin coating technique. The thickness of the films was about 200 nm. At 370 nm in the ultraviolet region, there is a sharp absorption edge that corresponds to the ZnO intrinsic band gap of 3.30 eV. The structural properties of the films were examined by X-ray diffraction, which demonstrates that the ZnO films were c-axis oriented. From the infrared spectrum, we conclude that ZnO was deposited on silica glass substrates through a high temperature process at 700°C.