Search Results - subject:"sputtering"

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Synthesis and enhanced electrochemical supercapacitive properties of manganese oxide nanoflake electrodes

Inamdar, A.I.; Jo, Y.; Kim, J.; Han, J.; Pawar, S.M.; … - In: Energy 83 (2015) C, pp. 532-538

. The nanoflakes were produced via RF-magnetron sputtering with various excess oxygen contents (δ), and the electrochemical … the nanoflakes improved when the oxygen partial pressure increased during sputtering. At an optimal δ ∼ 0.6, the …

Persistent link: https://www.econbiz.de/10011264376

IMPROVEMENT OF RETENTIVITY IN TiOx/HfOx BILAYER STRUCTURE FOR LOW POWER RESISTIVE SWITCHING MEMORY APPLICATIONS

SARKAR, PRANAB KUMAR; ROY, ASIM - In: Surface Review and Letters (SRL) 22 (2015) 02, pp. 1550031-1

This paper reports the bipolar resistive switching (BRS) characteristics in Al/Ti/TiOx/HfOx/Pt heterostructure during a DC sweep cycle with current compliance (CC) of 250 μA. The improvement in the switching performance in a CMOS compatible Al/Ti/TiOx/HfOx/Pt memory cell has been observed. The...

Persistent link: https://www.econbiz.de/10011279106

OPTICAL PROPERTIES OF N-DOPED Cu2O THIN FILMS DEPOSITED BY RF-MAGNETRON SPUTTERING Cu2O TARGET

LAI, GUOZHONG; WU, YANGWEI; LIN, LIMEI; QU, YAN; LAI, FACHUN - In: Surface Review and Letters (SRL) 21 (2014) 04, pp. 1450052-1

N-doped Cu2O films were deposited on quartz substrates by reactive magnetron sputtering a Cu2O target. The optical …

Persistent link: https://www.econbiz.de/10010885169

STRUCTURE EVOLUTION AND ELECTRIC PROPERTIES OF TaN FILMS DEPOSITED ON Al2O3-BASED CERAMIC AND GLASS SUBSTRATES BY MAGNETRON REACTIVE SPUTTERING

ZHOU, YAN MING; MA, YANG ZHAO; XIE, ZHONG; HE, MING ZHI - In: Surface Review and Letters (SRL) 21 (2014) 02, pp. 1450028-1

substrates by magnetron reactive sputtering were carried out as a function of the N2-to-Ar flow ratio. The TaN thin films on Al2O …

Persistent link: https://www.econbiz.de/10010757468

THERMOELECTRIC AND MAGNETO-THERMOELECTRIC PROPERTIES OF Ga-DOPED ZnO THIN FILMS BY RF MAGNETRON SPUTTERING

LIU, H.; FANG, L.; WU, F.; TIAN, D. X.; LI, W. J.; LU, Y.; … - In: Surface Review and Letters (SRL) 21 (2014) 03, pp. 1450033-1

glass substrates by RF magnetron sputtering. The crystal structure, electrical, thermoelectric and magneto …

Persistent link: https://www.econbiz.de/10010779419

Multi-component nano-composite electrode for SOFCS via thin film technique

Cho, Gu Young; Lee, Yoon Ho; Cha, Suk Won - In: Renewable Energy 65 (2014) C, pp. 130-136

NiO-YSZ nano-composite thin film mixed ionic electronic conducting (MIEC) electrode was prepared by co-sputtering … technique. Pure nickel target and YSZ target were used for DC and RF sputtering, respectively. XRD analysis was carried out for …

Persistent link: https://www.econbiz.de/10011046234

Improved thermoelectric performance of a film device induced by densely columnar Cu electrode

Tan, Ming; Deng, Yuan; Hao, Yanming - In: Energy 70 (2014) C, pp. 143-148

films were fabricated by a magnetron sputtering method. These films have been integrated into low-dimension cross …

Persistent link: https://www.econbiz.de/10011053315

Low platinum, high limiting current density of the PEMFC (proton exchange membrane fuel cell) based on multilayer cathode catalyst approach

Fofana, Daouda; Natarajan, Sadesh Kumar; Hamelin, Jean; … - In: Energy 64 (2014) C, pp. 398-403

Novel multilayer cathode electrodes structures for PEMFC (proton exchange membrane fuel cell) based on sputtering …

Persistent link: https://www.econbiz.de/10011055200

Enhancement in electrical performance of thin-film silicon solar cells based on a micro- and nano-textured zinc oxide electrodes

Chen, Ze; Zhang, Xiao-dan; Fang, Jia; Liang, Jun-hui; … - In: Applied Energy 135 (2014) C, pp. 158-164

modifying these sharp features. The BZO films were smoothened by performing a sputtering hydrogen-doped ZnO (HZO) layer using a … magnetron sputtering system. The a-Si:H solar cells based on BZO films subjected to this treatment exhibited a higher open …

Persistent link: https://www.econbiz.de/10011076506

INVESTIGATION OF Ta/Ni–Al INTEGRATED FILM USED AS A DIFFUSION BARRIER LAYER BETWEEN Cu AND Si

YANG, LIM; WANG, SHI JIE; HUO, JI CHUAN; LI, XIAO HONG; … - In: Surface Review and Letters (SRL) 21 (2014) 06, pp. 1450079-1

Ta (3.3 nm)/Ni–Al (3.3 nm) integrated films deposited on Si substrates by magnetron sputtering, annealed at various …

Persistent link: https://www.econbiz.de/10011106360