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Polycrystalline vanadium oxide (VOx) thin films with mixed phases of V6O13 + VO2 (M) are deposited onto p-doped Si (100) substrates at 430°C using magnetron sputtering. By vacuum annealing on as-deposited VOx thin films at 450°C, at different annealing times we obtained nanoscale...
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Diffusion of H atom in the Ti(0001) outer-layer and inter-layer surface is studied using density functional theory based on generalized gradient approximation (GGA). The energy barriers for the hydrogen atom diffusion in different interstitial sites at the same layers or between adjacent layers...
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