Deposition of the Stoichiometric Coatings by Reactive Magnetron Sputtering

The investigations of the reactive magnetron depositing of the stoichiometric coatings “metal-metalloid” were done. The dependences between sputtering parameters of a target and processes of plasmochemical formation on the surface of sample “metal-metalloid” and formations of coatings of the appropriate structure were investigated. Experimental data on stoichiometric coatings AlN, Al2 O3 , TiN, TiO2 is given. Features of reactive magnetron deposition and investigation results for obtaining of coatings with pregiven properties in particular for providing stability and controllability of coating deposition processes in time