FIRST PRINCIPLES STUDY OF BORON SEGREGATION ON THE ${\rm Si}(111)(\sqrt{3} \times \sqrt{3}){\rm R}30^{\circ}$ SURFACE
Segregation of boron on ${\rm Si}(111)(\sqrt{3} \times \sqrt{3}){\rm R}30^{\circ}$ surface has been studied using the periodical calculations within the local density approximation. The obtained segregation energy (enthalpy) of about -1.9 eV is close to the published data of experimental studies and previous cluster semiempirical calculations. The influence of plane-wave basis set cutoff energy and the slab unit cell depth on the value of segregation energy has been investigated.
Year of publication: |
2009
|
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Authors: | ZAVODINSKY, V. G. ; CHUKUROV, E. N. ; KUYANOV, I. A. |
Published in: |
Surface Review and Letters (SRL). - World Scientific Publishing Co. Pte. Ltd., ISSN 1793-6667. - Vol. 16.2009, 02, p. 167-170
|
Publisher: |
World Scientific Publishing Co. Pte. Ltd. |
Subject: | Silicon | boron | surface | ab initio | dopants | segregation |
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