Modelling and control of plasma etching processes in the semiconductor industry
| Year of publication: |
1999
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|---|---|
| Authors: | Meng, H. ; Russell, P.C. ; Lisboa, P.J.G. ; Jones, G.R. |
| Published in: |
Computers & industrial engineering : CAIE ; an internat. journal. - Amsterdam [u.a.] : Elsevier, ISSN 0360-8352, ZDB-ID 1969936. - Vol. 37.1999, 1-2, p. 367-370
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