SYNTHESIS AND PROPERTY STUDY OF NANOPARTICLE QUATERNARY SEMICONDUCTOR SiCAlN FILMS WITH CO-SPUTTERING UNDER LOWER TEMPERATURE

Quaternary SiCAlN nanoparticle films were produced by reactive rf magnetron co-sputtering technique with a chemically pure SiC and an Al target under low temperature. The crystalline structure, surface morphology, and element content of the films were studied in terms of sputtering parameters. The element content and chemical states of SiCAlN films were measured by means of energy dispersive X-ray fluorescence (EDX) and X-ray photoelectronic spectroscopy (XPS). Surface morphology of SiCAlN films was investigated by FE-SEM.