Technical Extendability of Proximity X-ray Lithography Towards Sub-100 nm Domain
| Year of publication: |
1994
|
|---|---|
| Authors: | Li, Dz-Chi ; Sun, Cherng-Yuan ; Cullmann, Elmar |
| Published in: |
Journal of scientific and industrial research : JSIR. - New Delhi : Council, ISSN 0022-4456, ZDB-ID 4104080. - Vol. 53.1994, 10, p. 758-767
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