WANG, Y. L.; LI, M. C.; ZHAO, L. C. - In: Surface Review and Letters (SRL) 15 (2008) 01, pp. 59-64
Polycrystalline vanadium oxide (VOx) thin films with mixed phases of V6O13 + VO2 (M) are deposited onto p-doped Si (100) substrates at 430°C using magnetron sputtering. By vacuum annealing on as-deposited VOx thin films at 450°C, at different annealing times we obtained nanoscale...