ZHU, H. B.; LI, X. D.; HUANG, S. Y.; JIN, C. X.; SUN, Z.; … - In: Surface Review and Letters (SRL) 13 (2006) 06, pp. 833-840
Indium tin oxide (ITO) thin films were prepared by radio frequency (RF) magnetron sputtering and under a quite low vacuum level of 2.3 × 10-3 Pa. The sputtering was done in an Ar and O2 gas mixture at a temperature of 200°C. A ceramic In2O3:SnO2 target (10 wt% SnO2) was used. The...