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Si 1 Silicon nanoarray 1 field emission 1 nanoarray 1 nanosphere lithography 1
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Article 2
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CHEN, K. J. 2 LI, W. 2 XU, J. 2 XU, L. 2 CEN, Z. H. 1 HAN, M. 1 HUANG, X. F. 1 MA, Z. Y. 1 SONG, F. Q. 1 SUN, P. 1 WAN, J. G. 1 ZHAO, W. M. 1 ZHOU, J. 1
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Surface Review and Letters (SRL) 2
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FABRICATION OF SILICON NANOARRAYS BY DIRECT NANOSPHERE LITHOGRAPHY
XU, L.; LI, W.; ZHAO, W. M.; SUN, P.; XU, J.; MA, Z. Y.; … - In: Surface Review and Letters (SRL) 14 (2007) 04, pp. 709-712
We present the fabrication of large-scale two-dimensional periodic silicon nanoarrays using nanosphere lithography. The techniques start from a monolayer of self-assembled polystyrene (PS) spheres of 220 nm in diameter on water surface, which works as a mask to fabricate large-scale periodic...
Persistent link: https://www.econbiz.de/10005047039
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FORMATION AND FIELD EMISSION CHARACTERISTICS OF AMORPHOUS AND CRYSTALLINE Si NANOARRAYS
XU, J.; LI, W.; ZHOU, J.; XU, L.; CEN, Z. H.; CHEN, K. J.; … - In: Surface Review and Letters (SRL) 14 (2007) 04, pp. 543-546
Highly ordered crystalline and amorphous Si nanoarrays have been formed by using self-assembled monolayer of polystyrene nanospheres as a template followed by dry ion etching treatments. The template was removed by annealing at 8°C and pattern transfer process was revealed by atomic force...
Persistent link: https://www.econbiz.de/10005050641
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