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Subject
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plasma simulation 2 ICP etching 1 heliophysics 1 laboratory plasma experiments 1 magnetohydrodynamics 1 profile evolution 1 surface reactions 1
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Online availability
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Free 1 Undetermined 1
Type of publication
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Article 2
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Undetermined 2
Author
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Amatucci, William 1 Brown, Michael 1 Chan, Vincent 1 Chen, James 1 Chua, Damien 1 Cothran, Christopher 1 Dahlburg, Jill 1 Dahlburg, Russell 1 Doschek, George 1 Egedal, Jan 1 Forest, Cary 1 GE, JIE 1 Howard, Russell 1 Huba, Joseph 1 Ko, Yuan-Kuen 1 Krall, Jonathan 1 LIU, XUAN 1 Laming, J. Martin 1 Lin, Robert 1 Linton, Mark 1 Lukin, Vyacheslav 1 Murphy, Ronald 1 REN, TIANLING 1 Rakowski, Cara 1 SONG, YIXU 1 Socker, Dennis 1 Tylka, Allan 1 Vourlidas, Angelos 1 Warren, Harry 1 Wood, Brian 1 YANG, YI 1
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Energies 1 Surface Review and Letters (SRL) 1
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RePEc 2
Showing 1 - 2 of 2
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Exploiting Laboratory and Heliophysics Plasma Synergies
Dahlburg, Jill; Amatucci, William; Brown, Michael; … - In: Energies 3 (2010) 5, pp. 1014-1048
Recent advances in space-based heliospheric observations, laboratory experimentation, and plasma simulation codes are … observations and simulations), and a dynamo facility under construction there; the Space Plasma Simulation Chamber at the Naval …
Persistent link: https://www.econbiz.de/10011030794
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REACTION SIMULATION AND EXPERIMENT OF A Cl2/Ar INDUCTIVELY COUPLED PLASMA FOR ETCHING OF SILICON
GE, JIE; LIU, XUAN; YANG, YI; SONG, YIXU; REN, TIANLING - In: Surface Review and Letters (SRL) 21 (2014) 03, pp. 1450038-1
As the key feature size keeps shrinking down, inductively coupled plasma (ICP) has been widely used for etching. In this study, a commercial ICP etcher filled with Cl2/Ar mixture was simulated. The simulation was based on a commercial software CFD-ACE+, which is a multi-module solver. For the...
Persistent link: https://www.econbiz.de/10010779415
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