A set of thin tantalum films was prepared by direct current (DC) magnetron sputtering using different substrate temperatures and sputtering power. In order to identify the optimal condition for hillock free thin tantalum (Ta) film deposition, AFM was employed to measure surface morphology of the...

The effect of MgO on structure and dielectric properties of aluminoborosilicate glasses was investigated. FTIR data indicated that glass network was mainly built by tetrahedral [SiO4], [BO4], [AlO4] and trigonal [BO3]. A small amount of AlO5 or AlO6 units also existed. The glass system was...

RO-Al2O3-B2O3-SiO2 (R = Ca, Mg) glasses containing different concentrations of TiO2 (ranging from 0 to 9 mol.%) were prepared by conventional melting method. When TiO2 was present in lower concentrations (≤ 6 mol.%), Fourier-transform infrared spectroscopy (FTIR) indicated that titanium ions...

LaNiO3(LNO) thin films were prepared on Si(100) substrates by a chemical solution deposition method. The orientation of LNO films was controlled by changing the acetic acid amount, concentration of the precursor solutions and pre-annealing time. The highly (100)- and (110)-oriented LNO films...