Nitrogenated diamond-like carbon films have been deposited on glass and p-type Si (100) substrates by radio frequency (r.f.) plasma-enhanced chemical vapor deposition (PECVD) with a frequency of 13.56 MHz at room temperature using CH4 as precursor of carbon source and H2 as a carrier gas. The...

We have studied the influence of the methane gas (CH4) flow rate on the composition and structural and electrical properties of nitrogenated amorphous carbon (a-C:N) films grown by surface wave microwave plasma chemical vapor deposition (SWMP-CVD) using Auger electron spectroscopy, X-ray...

Amorphous carbon nitride (a-CNx) films were deposited on quartz substrates by newly developed surface wave microwave plasma chemical vapor deposition (SWMP-CVD) of alcohol camphoric carbon plasma source at room temperature. Then the a-CNx films were heat-treated at various annealing temperatures...

Nitrogen doped amorphous carbon (a-C:N) thin films were deposited on silicon and quartz substrates by microwave surface-wave plasma chemical vapor deposition (SWMP-CVD) technique at low temperatures (100°C). We used argon (Ar), camphor dissolved in alcohol, and nitrogen (N) as carrier, source,...

This paper reports on the successful deposition of phosphorus (P)-doped n-type (p-C:P) carbon (C) films, and fabrication of n-C:P/p-Si cells by pulsed laser deposition (PLD) using graphite target at room temperature. The cells performances have been given in the dark I–V rectifying curve and...

The properties and optical band gap excitation of nanoporous titanium dioxide (TiO2) and transparent semiconducting copper iodide (CuI) films prepared by a XeCl excimer laser were investigated. The CuI films exhibited optical transmittance over 80% in the wavelength range from 400 to 900 nm with...

Amorphous carbon nitride (a-CNx) films have been deposited by pulsed laser deposition at 0.8 Torr nitrogen gas ambient with varying substrate temperature from 20 to 500°C. The effects of the substrate temperature and ambient nitrogen gas pressure on the surface morphology, composition, nitrogen...

Carbon films have been deposited on quartz and single-crystal silicon substrates by pulsed laser deposition technique. The soot for the target was obtained from burning camphor, a natural source. The effect of nitrogen (N) incorporation in camphoric carbon film is investigated. Optical gap for...

Phosphorus-doped amorphous carbon (n-C:P) films were grown by r. f.-power-assisted plasma-enhanced chemical vapor deposition at room temperature using a novel solid red phosphorus target. The influence of phosphorus doping on material properties of n-C:P based on the results of simultaneous...

ZnO and Zn1-xMgxO thin films were prepared on glass and silicon substrates by spin coating method using 2-methoxyethanol solution of zinc acetate dihydrate and magnesium acetate dihydrate stabilized by monoethanolamine. The effects of drying and annealing condition of structural and optical...