A dispatching rule for photolithography scheduling with an on-line rework strategy
Year of publication: |
2006
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Authors: | Sha, D.Y. ; Hsu, S.Y. ; Che, Z.H. ; Chen, C.H. |
Published in: |
Computers & industrial engineering : CAIE ; an internat. journal. - Amsterdam [u.a.] : Elsevier, ISSN 0360-8352, ZDB-ID 1969936. - Vol. 50.2006, 3, p. 233-247
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