A new type of TiN coating combining broad band visible transparency and solar control

Production of thin films of Titanium nitride (TiN) with N/Ti ratios as high as 1.3 has been achieved without destroying the metallic properties characteristic of stoichiometric TiN. The resultant change in mobile electron density shows that by depositing thin films the onset of a rise in reflection can be pushed out almost into the near infra red. It then becomes possible to produce films which transmit daylight neutrally at reasonably high levels, while still maintaining solar control in the NIR and a low emittance. Nitrogen ion assisted cathodic arc deposition has been used to achieve these results. Both the additional impacting and implanting nitrogen ions raise stoichiometry and help to reduce disorder so as to maintain good metallic character.