Capacity allocation model for photolithography workstation with the constraints of process window and machine dedication
| Year of publication: |
2006
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|---|---|
| Authors: | Chung, S.H. ; Huang, C.Y. ; Lee, A.H.I. |
| Published in: |
Production planning & control : PPC. - London [u.a.] : Taylor & Francis, ISSN 0953-7287, ZDB-ID 10481977. - Vol. 17.2006, 7, p. 678-688
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