Co-creation as a risk-sharing strategy for the development of innovative EUV lithography technology in the semiconductor industry

Subhojit Banerjee and Anuj K. Sharma

Year of publication:	2015
Authors:	Banerjee, Subhojit ; Sharma, Anuj K.
Published in:	Technology analysis & strategic management. - Abingdon, Oxfordshire : Routledge, Taylor & Francis, ISSN 0953-7325, ZDB-ID 32138-2. - Vol. 27.2015, 9, p. 1097-1113
Subject:	co-creation \| NTD \| risk-sharing \| EUV \| ASML \| Halbleiterindustrie \| Semiconductor industry \| Kundenintegration \| Customer integration \| Innovationsmanagement \| Innovation management \| Innovation \| Risiko \| Risk \| Technischer Fortschritt \| Technological change \| Halbleiter \| Semiconductor

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