Effect of HCl addition on the properties of p-type silicon thin films during hot-wire chemical vapor deposition
Year of publication: |
2013
|
---|---|
Authors: | Lee, Sang-Hoon ; Chung, Yung-Bin ; Lee, Sung-Soo ; Jung, Jae-Soo ; Hwang, Nong-Moon |
Published in: |
Renewable Energy. - Elsevier, ISSN 0960-1481. - Vol. 54.2013, C, p. 85-90
|
Publisher: |
Elsevier |
Subject: | P-type silicon thin films | Chemical vapor deposition | Silicon nanoparticles | Raman spectroscopy | Crystalline volume fraction |
-
Gogova, D, (1996)
-
HYDROGENATED AMORPHOUS/NANOCRYSTALLINE SILICON THIN FILMS ON POROUS ANODIC ALUMINA SUBSTRATE
KIM, SANG-OK, (2010)
-
Possible origin for the experimental scarcity of KPZ scaling in non-conserved surface growth
Cuerno, Rodolfo, (2002)
- More ...
-
Korea's general trading companies
Lee, Sung-soo, (1987)
-
Financial flows in the Korean economy
Lee, Sung-soo, (1988)
-
The impacts of change management practices on project change cost performance
Zou, Yi, (2008)
- More ...