Effects of R&D intensity on firm performance in Taiwan’s semiconductor industry
Tsung-chun Chen, Dong-Qiang Guo, Hsiao-Min Chen and Tzu-ti Wei
| Year of publication: |
2019
|
|---|---|
| Authors: | Chen, Tsung-chun ; Gao, Dong-Qiang ; Chen, Hsiao-Min ; Wei, Tzu-ti |
| Published in: |
Economic research. - Abingdon : Routledge, Taylor & Francis Group, ISSN 1331-677X, ZDB-ID 2171828-3. - Vol. 32.2019, 1,3, p. 2377-2392
|
| Subject: | R&D intensity | business performance | lagged effect | dynamic panel data | firm size | Unternehmenserfolg | Firm performance | Taiwan | Halbleiterindustrie | Semiconductor industry | Betriebsgröße | Firm size | Industrieforschung | Industrial research | Panel | Panel study | Industrie | Manufacturing industries |
| Type of publication: | Article |
|---|---|
| Type of publication (narrower categories): | Aufsatz in Zeitschrift ; Article in journal |
| Language: | English |
| Other identifiers: | 10.1080/1331677X.2019.1642776 [DOI] |
| Source: | ECONIS - Online Catalogue of the ZBW |
Persistent link: https://www.econbiz.de/10012584676