STRUCTURE AND PHOTOCATALYTIC PROPERTIES OF N-DOPED TiO2-x FILMS PREPARED BY N-ION IMPLANTATION

Nitrogen doped TiO2-x films have been prepared by using N-ion implantation method. X-ray diffraction patterns of the N-doped TiO2-x films could be indexed with rutile TiO2 and Ti7O13 in structure. XPS measurements revealed a 2.73 atm.% concentration of N atoms in the N-doped films and two N 1 s photoelectron binding energies at 396.3 and 399.9 eV originating from N-doped TiO2 and N-doped Ti7O13, respectively. The photocatalytic properties of the N-doped films under visible light have been investigated by degradation of methylene blue solution.