A Monte Carlo percolative approach to reliability analysis of semiconductor structures

We present a reliability analysis associated with the electrical degradation and failure of a thin-film due to the stochastic generation of defects driven by local Joule heating. To this purpose a combined Monte Carlo percolative approach is used. The thin-film is modelled as a two-dimensional resistor network and its degradation is characterized by a breaking probability of the single resistor related to the substrate temperature and to the local Joule heating. The dependence of the single resistor on the local temperature is taken into account. Furthermore, the introduction of a recovery of the damage, which hinders the irreversible degradation of the system by allowing a stationary state, is also discussed.