A model-based clustering approach to the recognition of the spatial defect patterns produced during semiconductor fabrication
| Year of publication: |
2008
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|---|---|
| Authors: | Yuan, Tao ; Kuo, Way |
| Published in: |
IIE transactions / Institute of Industrial Engineers, Norcross, Ga : industrial engineering and development. - Philadelphia, Pa : Taylor & Francis, ISSN 0569-5554, ZDB-ID 2460191. - Vol. 40.2008, 2, p. 93-101
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